Comparison of Properties of Ti/TiN/TiCN/TiAlN Film Deposited by Cathodic Arc Physical Vapor and Plasma-assisted Chemical Vapor Deposition on Custom 450 Steel Substrates

نویسندگان

  • Akbar Salarvand Department of Mechanical Engineering , Islamic Azad University, Doroud Branch, Iran
چکیده مقاله:

This study investigated the effects of deposition techniques on the microstructural and tribological properties of Ti/TiN/TiCN/TiAlN multilayer coatings onto a Custom 450 steel substrate. The coatings were produced using cathodic arc physical vapor deposition (CAPVD) and plasma-assisted chemical vapor deposition (PACVD). The microstructural of the coatings was evaluated using (SEM), and phase formation was analyzed by (XRD). The mechanical properties of the coatings were examined by nano-indentation testing machine. Erosion behavior was studied using an erosion tester and the electrochemical behavior of the deposited films in 3.5% (wt) NaCl solution was investigated using potentiodynamic polarization. XRD analysis indicated that TiN, TiCN, and TiAlN featured different chemical compositions in each coating. Nano-indentation showed that the hardness of the CAPVD coating was 23.35 GPa and of the PACVD coating was 12.92 GPa. The coefficient of friction was 0.22 for the CAPVD and 0.17 for the PACVD coatings. Erosion testing was conducted using two abrasive powders at impact angles of 30° and 90°. The results showed that erosion rate at an impingement angle of 90° was greater than at 30° and the CAPVD coating showed better performance. The potentiodynamic polarization curves showed that the CAPVD coating provided better corrosion resistance than the PACVD coating.

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Determination of Optical Properties in Germanium Carbon Coatings Deposited by Plasma Enhanced Chemical Vapor Deposition

In this research, Germanium-carbon coatings were deposited on ZnS substrates by plasma enhanced chemical vapor deposition (PECVD) using GeH4 and CH4 precursors. Optical parameters of the Ge1-xCx coating such as refractive index, Absorption coefficient, extinction coefficient and band gap were measured by the Swanepoel method based on the transmittance spectrum. The results showed that the refra...

متن کامل

Pulsed DC- Plasma Assisted Chemical Vapor Deposition of α-rich Nanostructured Tantalum Film: Synthesis and Characterization

This paper is an attempt to synthesize nanostructured tantalum films on medical grade AISI 316L stainless steel (SS) using pulsed DC plasma assisted chemical vapor deposition (PACVD). The impact of duty cycle (17-33%) and total pressure (3-10 torr) were studied using field emission scanning electron microscopy (FESEM), grazing incidence x-ray diffraction (GIXRD), nuclear reaction analysis (NRA)...

متن کامل

A Review on Titanium Nitride and Titanium Carbide Single and Multilayer Coatings Deposited by Plasma Assisted Chemical Vapor Deposition

In this paper, we reviewed researches about the titanium nitride (TiN) and titanium carbide (TiC) single and multilayer coatings. These coatings were deposited by the plasma assisted chemical vapor deposition (PACVD) technique. Plasma-based technologies are used for the processing of thin films and coatings for different applications such as automobile and aerospace parts, computer disc drives,...

متن کامل

MD-Simulation of Duty Cycle and TaN Interlayer Effects on the Surface Properties of Ta Coatings Deposited by Pulsed-DC Plasma Assisted Chemical Vapor Deposition

In this work, molecular dynamics (MD) simulations were employed to investigate the effects of duty cycle changes and utilization of tantalum nitride interlayer on the surface roughness and adhesion of Ta coating deposited by pulsed-DC plasma assisted chemical vapor deposition. To examine the simulation results, some selected deposition conditions were experimentally implemented and characterize...

متن کامل

Characterization of Ultra Low-k SiOC(H) Film Deposited by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Copyright 2012 KIEEME. All rights reserved. This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted noncommercial use, distribution, and reproduction in any medium, provided the original work is properly cited. pISSN: 1229-7607 eISSN: 2092-7592 DOI: http://dx...

متن کامل

Ti-Cr-N Coatings Deposited by Physical Vapor Deposition on AISI D6 Tool Steels

In this study, physical vapor deposition (PVD) Ti-Cr-N coatings were deposited at two different temperatures 100 and 400ºC on hardened and tempered tool steel substrates. The influence of the applied deposition temperature on the physical and mechanical properties of coatings such as roughness, thickness, phase composition, hardness and Young’s modulus were evaluated. Phase compositions were st...

متن کامل

منابع من

با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ذخیره در منابع من قبلا به منابع من ذحیره شده

{@ msg_add @}


عنوان ژورنال

دوره 29  شماره 10

صفحات  1459- 1468

تاریخ انتشار 2016-10-01

با دنبال کردن یک ژورنال هنگامی که شماره جدید این ژورنال منتشر می شود به شما از طریق ایمیل اطلاع داده می شود.

میزبانی شده توسط پلتفرم ابری doprax.com

copyright © 2015-2023